Pulsed DC Magnetron Sputtering

Pulsed DC Magnetron Sputtering

Carbon Coater, Pulsed Laser deposition, Sputter Coater, Thermal evaporation
In the DC sputtering process by accelerating positive ions towards the target material (which is in negative potential) and colliding with its surface, due to the lack of electrical conductivity of the surface to move the charge, the positive charge accumulates on the surface of the target material. Due to this phenomenon, the tendency of the positive ions to move towards the target material is reduced and the sputtering process does not function properly. In the DC sputtering process of the dielectric material, the inner wall of the vacuum chamber is also coated with non-conductive material and traps the electric charge. This phenomenon, called the disappearing anode, causes the electrical charges from inclined toward this nonconductive layer. Due to this phenomenon, mini and macro arcs are created during the deposition…
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Vaccoat Products introduction on Nano Industry Magazine

Vaccoat Products introduction on Nano Industry Magazine

Sputter Coater
In this magazine, We could know about DTT- a desktop, a turbomolecular-pumped thermal evaporator for vacuum deposition of thin films, Our supplier on Russia and capability of the Vaccoat Products. Also about our other products such as DSR1 (Desk SEM sputter coater) that is a compact coating system able to coat carbon film and noble metals such as gold (Au), palladium (Pd), platinum (Pt) and gold/palladium (Au/Pd) on non-conductive or poorly conductive specimens, or DCR that is a compact carbon fiber coating system suitable for sample preparation for the use in a scanning electron microscope (SEM), Transmission electron microscope (TEM) and X-Ray analysis (EDX). You can see the bottom, a screenshot of nano industry magazine (http://www.nanoindustry.su/page/nano_en?lang=en) with our DTT.
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Military applications of the optics and vacuum thin film deposition

Military applications of the optics and vacuum thin film deposition

Sputter Coater
Optics are used almost anywhere in the military. From vision systems and target designators used by troops on the ground, through guidance systems utilized in both manned and unmanned aircraft, to reconnaissance and surveillance packages carried by satellites in Earth orbit. These optical systems are usually in a hard and variable temperature and humidity and in contact with abrasive materials such as sand and salt. The use of coatings deposited by different methods of the deposition is a definitive requirement for all these systems. These coatings, in addition to physically protect sensitive components and sensors against stressful conditions, should be such as to allow components and sensors to provide the proper function for which they are designed. Regarding the military status, all these tasks occur when the inappropriate operation and…
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The role of Un-Balanced Magnetron sputtering on the characteristics of

The role of Un-Balanced Magnetron sputtering on the characteristics of

Sputter Coater
The role of Un-Balanced Magnetron sputtering on the characteristics of Tin dioxide thin-film unbalanced and balanced magnetron sputtering. Sputtering was first introduced in 1852 and was used by a person named Groe. He could using an electrical discharge deposited the metal film on a cold cathode. At first, sputtering was used for deposition of the refractory metals film, whose deposition was not possible by thermal evaporation, but gradually, using radio frequency waves (RF), the possibility of dielectric films was also provided by the Suturing deposition method. Spotting is in fact the process of transferring the momentum of the particles (usually the ions of neutral gases) to the surface of the target. Parameters such as energy, angles and masses of the incident particles, as well as the binding energy between atoms,…
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Effect of bias on structure mechanical properties and corrosion resistance…

Effect of bias on structure mechanical properties and corrosion resistance…

Sputter Coater
Over the past few decades, technological advances have made it possible to deposition of the thin films under vacuum which referred to as "Hard Coatings". These coatings have different applications due to their special structural and physical properties as protective coatings. Hard coatings consist of nitrides, carbides and borides of intermediate metals such as titanium or carbon coatings such as diamonds. These coatings have many applications in improving tools (such as cutting and forming machines) and machine parts like valves. Properties of a thin film of hard coatings can be classified as follows: Structural characteristics such as thickness, crystallography, chemical composition, surface morphology and roughness.Physical and chemical characteristics such as density, electrical properties, magnetic properties, thermal, optical, oxidizability and corrosion.Mechanical properties such as hardness, adhesion, mechanical stress and friction. The…
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Phenom-world Company reports on Vaccoat Company’s sputtering system

Phenom-world Company reports on Vaccoat Company’s sputtering system

Sputter Coater
Dutch company Phenom-world is one of the leading electron microscopes manufacturers in the world. As we know, the imaging of the specimens by an electron microscope requires the sample preparation before the imaging. The sample preparation process involves deposition of a nanometer layer of electrical conductive material on the specimens, which gold and carbon is the most widely used material for this purpose. If the sample preparation stage is not properly executed, a good picture of the electron microscope cannot be obtained. Phenom-World Co. during negotiate to buy the Vaccoat Company’s products, Demands to test the performance of the SEM-Coater system (The single-cathode vacuum sputtering system model: DSR1). According to Marcel Larous, a representative of Phenom-world, the performance results of the single-cathode sputtering system model DSR1 were as follows: The…
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The role of the deposition method in the performance of thin film propskite solar cells

The role of the deposition method in the performance of thin film propskite solar cells

Pulsed Laser deposition
Proksytic solar cells are a kind of solar cell that combines the structure of Proksytic. This substance is often an organic-mineral hybrid of lead or tin halides. Proksytic materials such as methyl ammonium lead iodide are cheap and easy to make. The structure of Proksytic is a triple structure of materials, and its general formula is ABO3. This structure consists of octahedrons, in which the cations A are located in octahedral cavities. The thin-film propskite solar cells have high conversion efficiency and can be manufactured in cheap and cost-effective ways. Compared to silicon solar cells, which are usually made in multi-stage and expensive processes, propskite solar cells can be constructed easily in laboratory conditions. These cells have been the fastest solar technology ever since. The advantage of propskite solar cells…
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10th year of Vacuum Expo in  UK

10th year of Vacuum Expo in UK

Pulsed Laser deposition
If you are interested in the vacuum field, do not miss the vacuum exhibition scheduled for 9&10 October 2019 in Ricoh Arena Coventry UK. The demonstration of industrial and scientific applications of vacuum technology in the field of coating, analytical sciences, R&D, solar cells, metallurgy, pharmaceuticals, food and packaging, space technology tools and many others are facilities provided at the exhibition for the interested in the vacuum field. See the bellow link for details:https://www.vacuum-expo.com/ https://vaccoat.com/2019/06/16/vaccoat-advertisement-at-labmate-mmc-2019-stand-604/ https://vaccoat.com/2019/06/17/why-should-an-electron-microscope-sample-be-prepared/ https://vaccoat.com/2019/06/18/selection-of-suitable-material-for-preparing-an-electron-microscope-sample/
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Sputtering Process

Pulsed Laser deposition
Sputtering Process In a basic sputtering process, the cathode plate is bombarded by highly energetic positive Ar ions and generates plasma. The bombardment results removal of target atoms (sputtering), and deposition of them on the substrate and making the thin film.
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Selection of suitable material for preparing an electron microscope sample

Selection of suitable material for preparing an electron microscope sample

Pulsed Laser deposition
The most commonly used material to prepare samples of an electron microscope is gold. Gold provides high-quality microscopic images due to its high electrical conductivity and small grain size. For the EDX process, carbon layer instead of gold is used in the sample preparation process. Carbon has a small atomic number, and unlike gold, it does not add any peak to the X-ray spectrum of the specimens. For high-resolution (high-resolution) electron microscopic processes, the use of materials such as chromium (Cr), iridium (air), tungsten (W) is recommended. Due to very fine grain size, these materials enhance the image quality and resolution. These materials have a low sputtering rate and, due to their oxidize ability, should be deposited with a turbo-molecular pumped system in a high vacuum environment. Other materials used…
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