What is the GLAD Sputtering Technique?
There are various techniques for increasing the quality of thin films deposited by vacuum coating methods. GLAD Sputtering (Glancing Angle Deposition) or OLA (Oblique Angle Deposition) is one of the most widely used techniques in the sputtering deposition process. GLAD method helps to achieve different microstructural architectures and increases the surface area of thin films. In the GLAD Sputtering, you could make an array of periodic microstructures to increase the surface sensitivity.
Although the GLAD technique could apply to various vacuum vapor deposition methods. The DC Magnetron GLAD Sputtering is a simple and effective technique for vertical growth at the nanoscale. It can be reached by tilting the sample rotation system relative to the cathode during the deposition process.
The obliquely incident flux of the physical vapor deposition system results in the formation of a film with columnar microstructures that can orient toward the vapor source. By rotating the substrate during the deposition, we can create columns with different morphologies. The origin of the columnar structure in the GLAD Sputtering Technique is previously discussed in terms of the nucleation processes and based on the structure zone model.
As the physical vapor deposition process continues, the columnar structures are affected by the surface diffusion process, and the shape of the columns evolves during growth. Material deposition (Deposition Material Table) on pre-patterned substrates forces the columns to adopt a planar order which is very valuable for use in the field of photonic crystals.
A wide range of high porous thin films with different columnar structures can be grown by changing parameters such as the angle of the substrate relative to the cathode, the rotation speed of the sample holder, the vacuum chamber pressure, and the temperature.
Glancing angle techniques offer GLAD thin films with separate columns instead of continuous morphology that can be used in different thin film applications such as sensing devices, micro battery storages, solar cells, fabrication of periodic structures in photonic crystals, and anisotropic resistivity. However, the main application of GLAD thin films is in optical devices, since the optical properties of nanomaterials are influenced by their structure and architecture.
The columnar structure of deposited thin films could have different geometries such as spiral, zigzag, oblique columns with adjustable parameters such as column tilt angle, dimensions, and shape by using a coater system equipped with a rotation and tiltable sample holder. For more information on the theory and how this technique works, refer to reference number three of this article.
The rotational speed of the sample holder in these systems, as well as its angle to the cathode, can be controlled exactly. As a result, during thin films deposition of various materials including metals, oxides, etc., GLAD sputtering technique can be used in these systems and for a variety of uses; they can create thin films with nanostructured architecture.
If you are planning to use the GLAD Sputtering Technique and creating architectural nanostructured thin films, recommended to visit the Vac Coat Ltd. and its products.
Our Vacuum Sputter Coaters
Vacuum Sputtering systems manufactured by Vac Coat Ltd. are equipped with a sample holder with the ability to rotate and the ability to have an angle relative to the cathode. Our Sputter Coater Systems include Desk Sputter Coater – DSR1, Sputter Coater and Thermal Evaporator (DST3 & DST3-T), Magnetron Desk Sputter Coater (DST1-300 & DST1-170), Turbo Pumped Desk Sputter & Carbon Coater (DSCT & DSCT-T), and Desk Sputter and Carbon Coater (DSCR & DSCR-300). At the bottom of the text you can see and follow a number of Sputter Coater Systems.
For more information about GLAD sputtering technique, refer to the following these links:
- https://bit.ly/3jrTL7G
- https://doi.org/10.1016/j.pmatsci.2015.06.003
- Michael T. Taschuk, Matthew M. Hawkeye and Michael J. Brett, Glancing Angle Deposition, Chapter 13, pages 621-671, Copyright © 2010 Peter M. Martin. Published by Elsevier Inc.