Sputter yield is a key parameter in the sputter coating process that highly affects the sputtering efficiency and the deposition rate and is a function of several factors, including energy and target material.

HIPIMS method uses low duration, high-power pulses to generate highly ionised plasma for enhanced mechanical features in PVD coatings.

Glow Discharge Plasma is a colored plasma generated by passing electrical current through an ionized gas between two electrodes with many application, from light bulbs to sputter coating.

Plasma cleaning is an efficient, eco-friendly, and versatile surface plasma treatment that facilitates cleaning a surface to the atomic level or create desired functional groups on it for different applications.

Physical Vapor Deposition (PVD) is a set of vacuum deposition methods in which a solid material vaporizes in a vacuum environment and is deposit on the substrate as a thin film.

Deposition on a surface based on different physical and chemical coating processes can modify its surface structure and properties that can lead to various applications.

Pulsed Laser Deposition (PLD) is a high vacuum PVD technique in which a high-energy laser is used to ablate the target material and create a plasma plum with species of the same stoichiometry of the target to be deposited on the substrate.

High vacuum and Ultra-high vacuum systems provide a clean environment for processes that needs clean surfaces, as thin film deposition and surface analysis.

Helium leak detectors are high-precision vacuum leak detection systems used in finding local or integral vacuum leaks using various techniques like sniffer probe, spraying, etc.

Scanning electron microscopy (SEM) is a highly efficient method for imaging micro-nano structures. SEM has improved enormously to enhance image quality.

Aperture cleaning electron microscope is mainly achieved through thermal evaporation or plasma cleaning is an essential process to obtain high-resolution SEM/TEM images.