Sputter Coater and Thermal Evaporator – DST3-T

Desk Sputter Coater - DST3-T Three Shot Framed | VacCoat Product | Triple Target Turbomolecular Pumped Sputter Coater

The DST3-T is a triple-target turbomolecular-pumped multi vacuum-coating system, that combines thermal evaporator and sputter coater in one single compact desktop system. The high vacuum system is suitable for deposition of a wide range of materials. The triple magnetron target desk sputter coater can easily switch between evaporation and sputtering condition (Not simultaneously).

The DST3-T is equipped with a large chamber (300 mm diameter) and three 2” diameter water-cooled cathodes which make it suitable for long time deposition. The magnetron desk sputter coater is equipped with RF and DC power supplies. It can sputter semiconductors, dielectrics, and metal (Oxidizing and noble) targets.

The DST3-T sputter coating system with RF power supply is equipped with an auto adjustable matching box, minimizing the reflected power in the RF sputtering process. For increasing film adhesion to the substrate and to improve the film structures, a 300 V, DC bias voltage can be applied to the substrate (optional).

According to state of the cathodes, DST3-T is available in two models:

  • DST3 – TA (Angled Cathodes):

The DST3-TA is equipped with three angled cathodes with a common focal point. The sputter coater system can sputter from two or three (optional) targets simultaneously or independently to form alloys or multilayer deposition respectively. The maximum size of substrates in this model could be 3 inches.

Vac product DST3 Angled without Plasma
Vac product DST3 Angled with Plasma | Sputter Coater
Vac product DST3 Three Targets Angled
  • DST3 –TS (Straight Cathodes):

DST3-TS with three straight 2 inches water-cooled cathodes is suitable for sputtering a single large specimen with diameter up to 20 cm or several small specimens. 

Vac product DST3 Straight Cathodes

Thermal Evaporation of Triple Target Turbo Pumped Sputter Coater

The DST3-T is equipped with a high current power supply and low-voltage (resistive) thermal evaporation platform suitable for a wide variety of thermal evaporation applications. The sputter coating system allows controlled thermal evaporation of wide range materials onto substrate. Different types of thermal evaporation sources (Boat, Basket, and Coil) can be installed on the single thermal source holder.

Vac product DST3-T Inside Old Square

Features of Desk Sputter Coater

Hardware

  • Sputtering and Thermal Evaporation process in a compact system
  • High vacuum level with built-in turbo pump
  • Equipped with DC and RF power supplies suitable for metals, semiconductors and dielectrics
  • Three 2” water-cooled angled, magnetron cathodes suitable for producing alloy films (DST3-TA) and multilayer deposition
  • Large sample holder stage (8 inches) for DST3-S.
  • Cathode mask designed (DST3-S) for large substrate uniform deposition
  • One thermal source installation
  • Two fixed and movable quartz crystal monitoring system for real time thickness measurement (1 nm precision)
  • Gas injection control through two MFCs
  • Electronic gas valves
  • Two-stage rotary vane backing pump (Diaphragm and scroll pump)
  • Full range vacuum gauge
  • Cathode selection motor
  • Sample rotation, height and tilt adjustable (for 3-inch sample holders)
  • Equipped with 3 manual or electronic (optional) shutters
  • Programmable substrate heater (optional)
  • Unlimited deposition time without breaking vacuum
  • Two-year warranty
  • Vac coat Products are covered worldwide by both public and product Liability Insurance in case any property damage or personal injury happens caused by the Vac Coat systems.
Vac product DST3 Three Shots with Plasma without Rac

Automation

    • Intuitive touch screen to control the coating process and rapid data input
    • User friendly software, updatable via network
    • Semi-Fully automatic coating process (optional)
    • Repeatable, programmable sputtering process in the automatic mode
    • DC/RF/High current deposition parameters adjustable though the touch screen panel (optional)
    • Manual or automatic Timed and Thickness deposition
    • Storing coating recipes for repeatable depositions
    • Target selection for multilayer thin films
    • Electronic shutters
    • Automated cathode selection
    • Substrate heater programming and control through the software

Optional Facilities

  • RF sputtering for deposition of conductive and non-conducting targets
  • Plasma cleaner
  • 300 V DC substrate bias voltage
  • 500 °C substrate heater

Touch Screen Control

Triple Target Turbomolecular Pumped Sputter Coater is equipped with a 7” colored touch screen and semi-automatic control and data input that can be operated by even inexperienced users. The vacuum and deposition information can be observed as digital data or curves on the touch screen. Information of the last 300 coating can also be saved in the history page.

Vac product DST3-T Touch Screan

Sputter Coater Sample Holder

The holder is made according to the conventional size of microscope slides, but the user can order customize size according to his/her needs. On the sample holder number of clamps are created to hold the small samples with a simple method during the rotation.

Vac product DST3 Inside

Plasma Cleaner

The triple target sputter coater – DST3-T can be equipped to plasma cleaner as an option. Vacuum Plasma treatment/Cleaning is the process of removing organic matter from the surface of substrate or functionalizing it through the use of an ionized gas called plasma. Plasma treatment can modify the wettability of the substrate surface and enhance its hydrophilicity or hydrophobicity for effective subsequent depositions. Also, applying plasma to the substrate prior to thin film deposition eliminates surface contaminations (C-based, Oxides) and improves the adhesion between the substrate and the subsequent layers.

Clean Vacuum of Sputter Coater

The vacuum chamber of Sputter Coater – DST3-T is Cylindrical Pyrex with 300 mm OD and 200 mm H. The DST3-T is fitted with an internally mounted 90 l/s turbomolecular pump, backed by a 6 m3/h diaphragm or 4 m3/h two-stage Rotary Vane Pump.

Vac product DST3 Plasma Cleaning

Sputter Coater – DST3-T Specifications

Pumping Speed 90 l/s 350 l/s
Ultimate Pressure 7×10-6  Torr 7×10-7 Torr
  • Two-stage rotary vane pump 4 m3/h
  • Independent sputtering control rate for each cathode to produce fine grain structures
  • Automatic control of deposition power independent of pressure
  • Automatic control of the cathode’s temperatures to protect the life time of the magnets
  • Water-cooled high current electric feedthrough
  • Two precision Mass Flow Controller (MFC) for fine control of Ar flow and so reactive sputtering gas
  • Records and plots of coating parameters graphs
  • Transfers curves and deposition process data by a USB port to PC
  • 300V DC bias voltage (optional)
  • Equipped to plasma cleaner (optional)
  • Equipped to 500˚C substrate heater (optional)
  • DC power supply 0-1200V, 0-500 mA
  • 0-24 V, 0-100 A high current power supply
  • 300 W RF power supply with automatic matching box (optional)
  • Utilities: 220V-240V, 50/60HZ, 16A
  • Instrument dimensions: 50 cm H x 60 cm W x 47 cm D
  • Net Weight: 160 kg (pump, rack, and instrument case)
Vac product DST3-T Inside of Chamber | Triple Target Turbomolecular Pumped Sputter Coater
Vac product DST3-T Inside with Thermal Source | Triple Target Turbomolecular Pumped Sputter Coater
Vac product DST3-T Inside with Zoom of Thermal Source

Sputter Coater Applications

Options and Accessories

The Triple Target Turbomolecular Pumped Sputter Coater – DST3-T has the following options and accessories:

  • Quartz crystal sensors
  • Spare vacuum glass chamber
  • Sputtering Targets
  • Sealing gaskets
  • Thermal source materials
  • 300V DC bias voltage
  • Plasma cleaner
  • 500˚C substrate heater
Vac product DST3-T Inside of Chamber with Plasma

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