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Pulsed Laser Deposition and Thermal Evaporator System – PLD-T

for high-quality thin films in R&D workflows

High-stability pulsed laser deposition system

Versatile Pulsed Laser Deposition and Thermal Evaporator System – PLD-T is a high vacuum thin film deposition system enables to deposit different materials by both Pulsed Laser Deposition and Thermal Evaporation technique (Not Simultaneously). It can deposit complex materials and crystalline structures onto substrates with very little setup involved.

Pulsed Laser Deposition technique leads to efficient, none-thermal ablation and preserves the stoichiometry of the target materials. By applying this method, it could deposit materials such as nitrides, oxides, super lattices, polymers, and composites. PLD-T with triple thermal sources can also deposit thin films through thermal evaporation.

PLD-T physical vapor deposition system is a multi-technique precise thin film coating device that enables the user to perform state of the art research projects in various fields like optics, electronics, solar cell fabrication, etc.

Vac Desktop Pulsed Laser Deposition PLD 3shots
Vac PLD Inside
Vac Pulsed Laser Deposition PLD Inside
Vac PLD Thermal Source Holder
Vac PLD Monitor
Vac PLD Touch Screen

Target Manipulator

PLD deposition system is equipped with a multi-target manipulator which includes three 2 cm Dia. Targets are in standard size and all of our target manipulators are motorized, so as to enable automatic target selection and target rotation during the deposition process.

Thermal Evaporation

The Pulsed Laser Deposition System can be fitted with three independent heat resistance thermal evaporation sources. Different types of thermal evaporation sources (Boat, basket, and coil) can be installed on the thermal source holders for controlled thermal evaporation of a wide range of materials onto the substrate. The high-current power supply and low-voltage (Resistive) thermal evaporation platform are suitable for a wide variety of thermal evaporation applications. The thermal evaporation configuration is equipped with water-cooled feedthroughs accompanied by temperature sensor.

  • High vacuum level with a built-in turbo pump
  • Two-stage rotary vane backing pump (Diaphragm or scroll pump)
  • High-current DC power supply suitable for thermal evaporation of different materials
  • Quartz crystal monitoring system for real time thickness measurement (1 nm precision)
  • Reactive gas injection control through precision Mass Flow meter (MFC)
  • Full-range vacuum gauge
  • Rotatory sample holder with adjustable rotation, height, and tilt (For 3-inch sample holders)
  • Target manipulator with adjustable rotation speed
  • 3 thermal sources and special feedthrough
  • Equipped with electronic shutter (For thermal evaporation configuration)
  • Equipped to motorized boat selection
  • Two-year warranty
  • Vac coat Products are covered worldwide by both public and product Liability Insurance in case any property damage or personal injury happens caused by the Vac Coat systems.
  • Intuitive touch screen to control the coating process and rapid data input
  • User friendly software, updatable via network
  • Semi-full automatic timed or thickness coating process (Optional)
  • Deposition parameters adjustable though the touch screen panel (Optional)
  • Records and plots coating parameters graphs
  • 500 °C programmable substrate heater with software control
  • Metal, semiconductor, and dielectric films
  • Nano and microelectronic
  • Solar cell applications
  • Optical components coating
  • Thin film sensors
  • Magnetic thin film devices
Pumping Speed 90 l/s 250 l/s 350 l/s
Ultimate Pressure 8 x10-6  Torr 3 ×10-6 Torr 8 ×10-7 Torr
  • Unlimited deposition time without breaking the vacuum
  • Records and plots coating parameters graphs
  • Deposition process curves and data transfer by a USB port to PC
  • 2 kW high-current power supply
  • Water-cooled high-current electric feedthroughs
  • Utilities: 220 V – 110 V, 50/60 HZ
  • Dimensions: 500 mm H × 600 mm W × 470 mm D
  • Weight: 50 kg (Pump, , and instrument case)

The PLD-T has the following options and accessories:

  • Thermal evaporation sources (Boat/Basket/Coil)
  • 500 °C substrate heater
  • Thermal evaporation source materials
  • Quartz crystal sensors
  • Sealing gaskets

    Thermal Sources Holders

    The Pulsed Laser Deposition System can be fitted with three independent heat resistance thermal evaporation sources. The good design of the evaporation source holder causes no contamination transfer from a source materials to other ones. The length of source holders can be adjusted in the range of 5~10 cm to meet the user requirements.

    Clean Vacuum

    The PLD-T is designed with a 300 mm OD and 200 mm H, SST vacuum chamber. The PLD-T is fitted with an internally mounted turbo molecular pump, backed by a 6 m3/h two-stage rotary vane pump (Optional). It introduces a clean vacuum without oil contamination which normally exists with an ordinary diffusion pump.

    • Dimensions: 420 × 480 × 370 mm (H × W × D)
    • Weight: 30 Kg
    • Vacuum Chamber Dimension: Borosilicate Glass, 170 mm Dia. × 140 mm Height
    • Display Screen: 7” Diagonal (16:9) 800 × 480 High Color- Graphic TFT- LCD
    • Data Transfer: USB Port – For Transferring the data and graph to PC
    • Target Dimension: 1 Disc, Diameter ranging 50-56 mm, Thickness 0.1~3 mm (The preferred Thickness is less than 1 mm)
    • Sample Holder Dimension:
      • Standard holder with 60 mm Dia., can contain:
        • 23 × 9.6 mm stubs or
        • 14 × 12.7 mm stubs or
        • 5 × 19 mm stubs
      • Sample holder with 100 mm Dia. with Offset gear box can contain 40 × 12.7 mm stubs (Optional)
    • Chamber’s Lid: Made of Aluminum and can locate 1 Cathode on it
    • Specification: Crystal thickness gauge with sensor, gold coated crystal quartz, oscillator
    • Resolution: ±1 Angstrom
    • Accuracy: ±1 Nanometer
    • Vacuum Pump: Two-stage rotary vane
    • Vacuum Gauge Range: 1 × 103 – 1 × 10-3 Torr
    • Final Vacuum: 30 × 10-3 Torr
    • Sputtering: Continuous Sputtering, Time, and Thickness dependent
    • Gas: Argon as a carrier gas with %99.999 purity
    • Electric Power Supply: DC: 80 W switching DC power supply
    • Control of Argon supply: Electronic leak valve
    • Electrical Inlet: Inlet: 220-240 V, 50/60 Hz; or 110 V, 50/60 Hz *

    * Single-phase AC power with appropriate earth connection is required.

    Touch Screen Control

    The pulsed laser deposition system, PLD-T, is equipped with a 7” colored touch-screen panel using user-friendly software to control and adjust the deposition process data. The vacuum and coating sequence information can be observed as digital data or curves on the touchscreen and the last 300 coatings are saved on the history page.

    Vac Desk Pulsed Laser Deposition PLD 3shots

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