Products
Desk Sputter and Carbon Coater – DSCR-300
for versatile SEM and thin-film preparation
Dual-Function Desktop Coating System
The large chamber rotary pumped DSCR-300, desk sputter and carbon coater, with a 3 or 4-inch water-cooled magnetron cathode is a compact coating system for both sputter and carbon coating. This system is suitable for non-oxidizing targets deposition on large specimens. The water-cooled magnetron allow prolonged sputtering time, making it suitable for deposition of thick and thin layers.
With desk sputter coater model DSCR-300, one can deposit on different substrates for thin film applications such as micro and nano electronic and SEM sample preparation. It is also capable to sputter noble non-oxidizing metals (deposition material table) such as gold (Au), palladium (Pd), platinum (Pt), and gold/palladium (Au/Pd) on non-conductive or poorly conductive samples. Besides, the nano-structured specimen coated with a thin carbon film can be characterized through various techniques like FE-SEM, TEM, and EDX.
The 3-inch magnetron can be used to uniformly coat a sample of diameter up to 12 cm, and a sample with a diameter of about 15 cm can be coated with the 4-inch magnetron. Also, more than 40 SEM small stubs (12.7 cm dia.) can be loaded onto the 4-inch sample stage.
The DSCR-300 rotary pumped coater is configured for DC sputtering and carbon fiber (Thread) or carbon rod coating with interchangeable heads in one instrument. The full-automatic sputter and carbon coating processes allows easy, precise, and repeatable performance.
Carbon Coating Head
The device is equipped with an interchangeable head to carbon coating purpose. The ability of loading three carbon fibers with a maximum diameter of 0.8 mm, allows coating carbon layer on large samples for EDX.
Pulsed Carbon Fiber Evaporation
The DSCR-300 coater is able to perform pulsed carbon fiber evaporation. Short pulses provide more controlled deposition and significantly reduces the number of debris associated with traditional carbon deposition.
Carbon Rod Evaporation (Optional)
The DSCR-300 could be equipped with carbon rod evaporator head (Optional). For this case, an external 0-100 A high current power supply should be used instead of the internal high current power supply designed for carbon fiber evaporation.
- Two-stage, direct drive rotary vane pump 6 m3/h
- 160 W DC switching power supply for sputtering
- 0-25 A pulsed DC power supply for carbon fiber evaporation
- 0-100 A DC power supply for carbon rod evaporation (Optional)
- Quartz crystal thickness monitor with precision of 1 nm and resolution of 1 Å
- One 2, 3, or 4-inch magnetron cathode
- Electronic venting valve
- Sample rotation, height, and tilt adjustable
- Planetary sample rotation (Optional)
- Electronic shutter
- Easy-to-change specimen stages (Rotation stage as standard)
- Vac Coat products are covered worldwide by both public and product Liability Insurance in case any property damage or personal injury happens caused by the Vac Coat systems.
- Intuitive touch screen to control the coating process and rapid data input
- User friendly software, updatable via network
- Precise control over coating rate to achieve finer grain structures
- Manual or automatic timed and thickness deposition
- Semi-full automatic sputtering
- Semi-full automatic carbon fiber/rod deposition process
- Pulsed or flash carbon fiber coating modes
- Pulsed or ramped carbon rod coating modes
- Repeatable and programmable sputtering and carbon coating process in the automatic mode
- Records and plots coating parameters graphs
- Storing coating recipes for repeatable depositions
- Deposition of carbon and metals for SEM, FE-SEM, EDX, and TEM sample preparation
- Deposition of metal and dielectric films (with optional RF sputtering)
- Deposition of Conductive layers
- GLAD sputtering
- TEM grid plasma treatment for improved hydrophilicity
For sputtering of oxidizing metals, please see the DSCT (Turbo-pumped desk sputter & carbon coater).
- Suitable for deposition of noble metals, carbon fiber, and carbon rod (Optional)
- Automatic control of the cathode's temperature to protect the lifetime of the magnets
- Real-time plot of coating parameters
- Consuming power: 2 kW
- Appropriate packaging of the instrument for safe delivery
- Two-year warranty
- CE standard conformity
- Head and external power supply for carbon rod evaporation
- RF generator and auto matching box
- Quartz crystal sensor
- Planetary sample rotation stage
- Spare cylindrical vacuum glass chamber
- Sputtering targets
- Sealing gaskets
- Glow discharge plasma
- Carbon fiber source
Touch Screen Control
The DSCR-300, the desk SEM coater, is equipped with a 7” colored touch screen and full automatic control using a user-friendly software to control and adjust the deposition process data. The vacuum and coating sequence information can be observed as digital data or curves on the touch screen. The last 300 coatings information is saved on the history page.
Sample Holder Stages
The DSCR-300 can be equipped with different sample stage configurations depending on the user requirements. The 4-inch standard sample stage is rotatable with adjustable height and angle and can be changed easily. The rotary planetary sample stage is a good choice for the uniform coating of porous specimens (Optional).
For deposition on large samples, a 6-inch rotatable (no incline adjustable) sample holder stage is recommended (Optional).
- Dimensions: 600 × 550 × 650 mm (H × W × D)
- Weight: 42Kg (Without vacuum pump)
- Vacuum Chamber Dimension: Borosilicate Glass, 300 mm Dia. × 200 mm Height
- Display Screen: 7” Diagonal (16:9) 800 × 480 High Color- Graphic TFT- LCD
- Data Transfer: USB Port – For Transferring the data and graph to PC
- Target Dimension: 1 Disc, Diameter ranging 50-56 mm, Thickness 0.1~3 mm (The preferred Thickness is less than 1 mm), and less than 0.5 mm for ferromagnetic targets).
-A silver target is installed on the cathode when delivered - Sample Holder Dimension:
- 100mm Dia. tiltable, rotatable sample holder can contain 40×12.7 mm stubs
- 150 mm Dia. sample holder for large substrates
- Max. 200mm Dia. rotating stage
- Chamber’s Lid: Made of Aluminum and can locate one water-cooled 2/3/4-inch cathode at the lid center and/or a head for carbon source holder (Triple carbon fiber (Thread) holder or a rod holder) on it, based on the order.
- Specification: Crystal thickness gauge with sensor, Gold/Silver coated crystal quartz for Sputter/Carbon deposition thickness monitoring (best result for carbon film thickness monitoring with silver coated QCM), oscillator
- Resolution: ±1 Angstrom
- Accuracy: ±1 Nanometer
- Vacuum Pump: Two-stage rotary vane
- Vacuum Gauge Range: 103 – 1 × 10-3 Torr
- Final Vacuum: 30 × 10-3 Torr (Depends on the vacuum pump)
- Sputtering: Continuous Sputtering, Time, and Thickness dependent
- Carbon Coating:
- Pulsed and Flash mode carbon fiber coating
- Pulsed mode carbon rod coating
- Glow Discharge Plasma (Optional):
- TEM grid plasma treatment
- Enhancing surface hydrophilicity
- Gas: Argon as a carrier gas with %99.999 purity
- Electric Power Supply:
- DC: 160 W switching DC power supply (Based on the order)
- RF (Optional): 300 W RF power supply
- HC: 24V, 20A (Carbon fiber evaporation)
- HC: 12V, 100A (Carbon rod evaporation)
- Control of Argon supply: Electronic valve
- Shutter: 1 piece
- Electrical Inlet: Inlet: 220-240 V, 50/60 Hz; or 110 V, 50/60 Hz *
* Single-phase AC power with appropriate earth connection is required.
