AVS 72 International Symposium & Exhibition
The 72nd AVS International Symposium & Exhibition (AVS 72), organised by the American Vacuum Society (AVS), will take place on 8–13 November 2026 at the David L. Lawrence Convention Center in Pittsburgh, Pennsylvania, USA. The event brings together researchers, engineers, equipment manufacturers and industry professionals working in vacuum science, materials processing, surface engineering and advanced device fabrication.
AVS 72 is focused on the development of advanced materials, including 2-D materials, deposition processes, which is particularly relevant to experts involved in plasma-based thin-film coatings and physical vapour deposition (PVD).
The Thin Films (TF) division covers the fundamentals, deposition, and applications of thin films as functional coatings, such as perovskite photovoltaics, battery engineering, advanced microelectronic materials and devices, and atomic-scale processing provide opportunities to explore deposition techniques for emerging technologies.
The Plasma Science and Technology (PS) programme is another key area for coating technology specialists, addressing plasma diagnostics, plasma processes for advanced interconnects, ion and reactant control, simulation, and machine-learning-assisted plasma processing.
AVS topics including nanoscale materials, magnetic interfaces, advanced surface engineering, battery materials and electronic devices, along with the technical exhibition, provide an opportunity for academia and industry working in the area of plasma-assisted deposition and multilayer coatings, magnetron sputtering, and reactive sputtering to discuss related issues and solutions.
Vac Coat vacuum coating systems employ PVD techniques, including magnetron sputtering, thermal evaporation, and pulsed laser deposition, to deposit various thin films in a controllable condition to achieve high-quality, reproducible coatings for demanding applications.
More about this conference: https://avs72.avs.org/
