
Upgrading the Sample Planetary Rotation System
[vc_row][vc_column][vc_single_image image="3380" img_size="large" alignment="center" onclick="link_image"][/vc_column][/vc_row][vc_row][vc_column width="1/4"][vc_wp_posts number="10"][/vc_column][vc_column width="3/4"][vc_column_text] Upgrading the Sample Planetary Rotation System One of the characteristics of a suitable thin film is the degree of uniformity of the deposited layer. Rotation of the substrate during coating is one of the most effective ways to increase the uniformity of thin film deposited in the Physical Vapor Deposition (PVD) method. The effectiveness of substrate rotation in improving the uniformity of the deposited thin film depends on the geometry of the substrate and how it rotates during the coating process. For example, in the case of substrates with a flat geometric shape (such as a disk), rotation about an axis perpendicular to the surface of the substrate is sufficient to create a uniform layer on it. However, for more complex geometric…