The 17th International Symposium on Sputtering & Plasma Processes (ISSP2024) with the main theme of “A new dawn of sputtering & plasma processes towards sustainable development” will be held from 2 to 5th of July, 2024, in Kyoto, Japan. The general tendency of the ISSP2024 is the application of the sputtering technology in industry.
The biennially held ISSP, established in 1991 with the main subject of Reactive Sputtering, is organized by the Japan Society of Vacuum and Surface Science (JSVSS) with a focus on the current trends concerning sputtering and plasma processes.
The main areas to be addressed in ISSP2024 include:
・Fundamental of Sputtering and Plasma Processes
・Sputtering and Plasma Process Technologies
・Pulsed Sputtering and HiPIMS
・Fundamentals of Thin Films Growth
・Functional Thin Films and Advanced Coatings
・Applied Research and Industrial Applications
