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The large chamber rotary pumped DSCR-300, desk sputter and carbon coater, with a 3 or 4-inch water-cooled magnetron cathode is a compact coating system for both sputter and carbon coating. This system is suitable for non-oxidizing targets deposition on large specimens. The water-cooled magnetron allow prolonged sputtering time, making it suitable for deposition of thick and thin layers.
With desk sputter coater model DSCR-300, one can deposit on different substrates for thin film applications such as micro and nano electronic and SEM sample preparation. It is also capable to sputter noble non-oxidizing metals (deposition material table) such as gold (Au), palladium (Pd), platinum (Pt), and gold/palladium (Au/Pd) on non-conductive or poorly conductive samples. Besides, the nano-structured specimen coated with a thin carbon film can be characterized through various techniques like FE-SEM, TEM, and EDX.
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The 3-inch magnetron can be used to uniformly coat a sample of diameter up to 12 cm, and a sample with a diameter of about 15 cm can be coated with the 4-inch magnetron. Also, more than 50 SEM small stubs (1 cm dia.) can be loaded onto the 4-inch sample stage.
The DSCR-300 rotary pumped coater is configured for DC sputtering and carbon fiber (Thread) or carbon rod coating with interchangeable heads in one instrument. The full-automatic sputter and carbon coating processes allows easy, precise, and repeatable performance.
Features of DSCR-300
Hardware
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- Two-stage, direct drive rotary vane pump 6 m3/h
- 80 W DC switching power supply for sputtering
- 0-25 A pulsed DC power supply for carbon fiber evaporation
- 0-100 A DC power supply for carbon rod evaporation (Optional)
- Quartz crystal thickness monitor with precision of 1 nm and resolution of 1 Å
- One 2, 3, or 4-inch magnetron cathode
- Electronic venting valve
- Sample rotation, height, and tilt adjustable
- Planetary sample rotation (Optional)
- Electronic shutter
- Easy-to-change specimen stages (Rotation stage as standard)
- Two-year warranty
- CE conformity
- Vac Coat products are covered worldwide by both public and product Liability Insurance in case any property damage or personal injury happens caused by the Vac Coat systems.
Automation
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- Intuitive touch screen to control the coating process and rapid data input
- User friendly software, updatable via network
- Precise control over coating rate to achieve finer grain structures
- Manual or automatic timed and thickness deposition
- Semi-full automatic sputtering
- Semi-full automatic carbon fiber/rod deposition process
- Pulsed or flash carbon fiber coating modes
- Pulsed or ramped carbon rod coating modes
- Repeatable and programmable sputtering and carbon coating process in the automatic mode
- Records and plots coating parameters graphs
- Storing coating recipes for repeatable depositions
Carbon Coating Head of DSCR-300
The device is equipped with an interchangeable head to carbon coating purpose. The ability of loading three carbon fibers with a maximum diameter of 0.8 mm, allows coating carbon layer on large samples for EDX.
Pulsed Carbon Fiber Evaporation
The DSCR-300 coater is able to perform pulsed carbon fiber evaporation. Short pulses provide more controlled deposition and significantly reduces the number of debris associated with traditional carbon deposition.
Carbon Rod Evaporation (Optional)
The DSCR-300 could be equipped with carbon rod evaporator head (Optional). For this case, an external 0-100 A high current power supply should be used instead of the internal high current power supply designed for carbon fiber evaporation.
Touch Screen Control
DSCR-300, the desk SEM coater, is equipped with a 7” colored touch screen and full automatic control using a user-friendly software to control and adjust the deposition process data. The vacuum and coating sequence information can be observed as digital data or curves on the touch screen. The last 300 coatings information is saved on the history page.
Sample Holder Stages
The DSCR-300 can be equipped with different sample stage configurations up to 15 cm, depending on the user requirements. The standard sample stage is rotatable with adjustable height and angle and can be changed easily.
Applications of DSCR-300
- Fine grain structural deposition of noble metals for SEM, FE-SEM, EDX, and TEM sample preparation
- Conductive layers
- GLAD sputtering
- TEM grid plasma treatment for improved hydrophilicity
Specifications of DSCR-300
- Suitable for deposition of noble metals, carbon fiber, and carbon rod (Optional)
- 300 mm OD x 210 mm H Pyrex cylinder chamber
- Dimensions: 58 cm H x 50 cm W x 63 cm D
- Ultimate vacuum: Less than 50 mTorr
- Rapid data input through fully automatic touch screen panel
- Real-time plot of coating parameters
- Deposition process data transfer to PC by USB port
- Utilities: 220 V/110 V, 50/60 HZ – 1.7 kW
- Shipping weight (Excluded vacuum pump): 42 Kg
Options and Accessories
- Head and external power supply for carbon rod evaporation
- Quartz crystal sensor
- Planetary sample rotation stage
- Spare cylindrical vacuum glass chamber
- Sputtering targets
- Sealing gaskets
- Plasma cleaner
- Carbon fiber source
Would like to know is the sputtering can evenly distributed across 300mm chamber. Also we would like to do the coating on the PCB with the components, what is the clearance in vertical from the target to the holder? At the same time please send me the quotation. Thanks
Basically, the plasma in a sputter coating chamber is not evenly distributed. Most sputtered target species mainly move in a straight line beneath or below the target, depending on the way target is mounted. For uniform deposition on larger substrates, it is recommended to use devices with larger cathodes, like DST1-300 with 4-inch cathode, or use DST3 with triple straight cathodes and specially designed cathode masks that can uniformly deposit an 8-inch sample.
The target-to-substrate-distance can be manipulated according to the user. Please click the Request a Quote bottom in our website and fill the form. Our colleagues will send you.