
Unbalanced Magnetron Cathodes
[vc_row][vc_column width="3/4"][vc_row_inner][vc_column_inner][vc_column_text] Unbalanced Magnetron Sputtering Cathodes Balanced and unbalanced magnetron cathodes in sputtering systems have their advantages and disadvantages as mentioned in “balanced and unbalanced magnetron sputtering” article. What is Unbalanced Magnetron? Balanced magnetic fields with magnetic field lines confined around the cathode, limit the charged colliding particles (electron-ions) to the target surface which benefits low friction coatings; whereas in an unbalanced magnetron with some magnetic field lines toward the substrate, the ions bombard the thin film, affecting thin film surface morphology and adhesion to the substrate, suitable for pre-cleaning and hard coatings. Since balanced cathodes are common, here we discuss the unbalanced magnetron cathodes and theirs specifications. [/vc_column_text][/vc_column_inner][/vc_row_inner][vc_row_inner css=".vc_custom_1716046704963{background-color: #d9d9d9 !important;}"][vc_column_inner width="1/2"][vc_single_image image="5307" img_size="large" add_caption="yes" alignment="center" style="vc_box_outline" border_color="mulled_wine"][/vc_column_inner][vc_column_inner width="1/2"][vc_video link="https://youtu.be/xjEOoKi6qUo?si=o_jqQE1m-0AD6ya3"][vc_column_text css=".vc_custom_1716069115122{margin-top: -20px !important;}"] How Triple Target Sputter Coater DST3-A…