
Thickness Uniformity of Thin Films by Magnetron Sputtering
[vc_row][vc_column width="3/4"][vc_row_inner][vc_column_inner][vc_column_text] Thickness Uniformity of Thin Films by Magnetron Sputtering Magnetron Sputtering is a highly advantageous method for depositing thin films of materials on a substrate for research and industrial purposes. Thickness Uniformity of thin film distribution is an important parameter in science and industry, which can be obtained by magnetron sputtering to a high degree of precision (<2% of thickness variation over the substrate) [1]. In addition, Vac Coat Sputter Coaters can sputter materials by Magnetron Sputtering Method. [/vc_column_text][/vc_column_inner][/vc_row_inner][vc_row_inner css=".vc_custom_1716069440133{background-color: #d9d9d9 !important;}"][vc_column_inner width="1/2"][vc_cta h2="" style="3d" color="mulled-wine" add_button="bottom" btn_title="Pulsed DC Sputtering" btn_style="3d" btn_color="juicy-pink" btn_align="center" btn_link="url:https%3A%2F%2Fvaccoat.com%2Fblog%2Fpulsed-dc-magnetron-sputtering%2F|target:_blank"] [/vc_cta][/vc_column_inner][vc_column_inner width="1/2"][vc_cta h2="" style="3d" color="mulled-wine" add_button="bottom" btn_title="Types of Thin Films" btn_style="3d" btn_color="juicy-pink" btn_align="center" btn_link="url:https%3A%2F%2Fvaccoat.com%2Fblog%2Fthin-film-and-thin-films-types%2F|target:_blank"] [/vc_cta][/vc_column_inner][/vc_row_inner][vc_row_inner][vc_column_inner width="1/2"][vc_column_text] However, some processes during deposition affect thickness uniformity of the resulting layer in magnetron sputtering. Based on theory, the…