24Oct 2022 by elina 8 Comments
What is Plasma?

What is Plasma?

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[vc_row][vc_column width="3/4"][vc_row_inner][vc_column_inner width="1/2"][vc_column_text css=""] Plasma Physics Plasma is the fourth state of matter that can be reached in high energies. Normally, when atoms in a solid gain enough energy it goes to liquid phase, and then the phase transition is continued to the gas phase at higher energy levels, and then plasma is formed at extremely high temperatures. In a typical plasma, some or all of the electrons in an atom gain enough energy to overcome nucleus potential barrier and an ionized gas is formed. So, plasma contains free electron-ions and is able to conduct electricity. Since atoms are normally neutral, the plasma is electrically neutral. Plasma may contain magnetic fields as moving electric charges create them. [/vc_column_text][/vc_column_inner][vc_column_inner width="1/2"][vc_single_image image="14348" img_size="large" alignment="center" style="vc_box_circle" css=""][/vc_column_inner][/vc_row_inner][vc_row_inner css=".vc_custom_1713565210840{background-color: #d9d9d9 !important;}"][vc_column_inner width="1/2"][vc_video link="https://youtu.be/94tReSbyPYc"][vc_column_text css=".vc_custom_1713565196254{margin-top:…
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15Oct 2022 by elina 2 Comments
Electron Microscope Invention: A Historical Overview

Electron Microscope Invention: A Historical Overview

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[vc_row][vc_column width="3/4"][vc_row_inner][vc_column_inner][vc_column_text] History of Electron Microscope (1930-1980) Nowadays, the electron microscope is an essential instrument to characterize new structures and materials and electron microscope invention has become a popular topic for scientific research. In a typical electron microscope a beam of electrons is focused upon a target specimen. Information is often gathered from electrons transmitted through or scattered from the specimen by Bragg diffraction, alongside data gathered from Auger electrons, characteristic x-rays, and the charge absorbed by the specimen. On the basis of particle-wave duality theory of de Broglie, electrons can replace photons in a microscope to improve the image resolution more than 5000 times. [/vc_column_text][/vc_column_inner][/vc_row_inner][vc_row_inner css=".vc_custom_1715593366791{background-color: #d9d9d9 !important;}"][vc_column_inner width="1/2"][vc_video link="https://youtu.be/ljTEG-B-kGc" align="center"][vc_column_text css=".vc_custom_1715593799395{margin-top: -20px !important;}"] The Principle of the Electron Microscope [/vc_column_text][/vc_column_inner][vc_column_inner width="1/2"][vc_cta h2="" txt_align="center" style="3d" color="mulled-wine" add_button="bottom" btn_title="More About"…
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16Aug 2022 by elina No Comments
Tin Dioxide Thin Film by Unbalanced Magnetron Sputtering

Tin Dioxide Thin Film by Unbalanced Magnetron Sputtering

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[vc_row][vc_column width="3/4"][vc_row_inner][vc_column_inner][vc_column_text] Case Study: The Role of Unbalanced Magnetron Sputtering on the Characteristics of Tin Dioxide Thin Film Indian researchers have succeeded in improving the optical, electrical, and structural properties of tin dioxide thin film by investigation the effect of using unbalanced magnetron sputtering on the properties of tin dioxide thin film. [/vc_column_text][/vc_column_inner][/vc_row_inner][vc_row_inner css=".vc_custom_1715594950177{background-color: #d9d9d9 !important;}"][vc_column_inner width="1/2"][vc_video link="https://www.youtube.com/watch?v=xjEOoKi6qUo" align="center" css=".vc_custom_1715595330762{border-radius: 2px !important;}"][vc_column_text css=".vc_custom_1715594925919{margin-top: -20px !important;}"] How Triple Target Sputter Coater DST3-A Works? [/vc_column_text][/vc_column_inner][vc_column_inner width="1/2"][vc_cta h2="" txt_align="center" style="3d" color="mulled-wine" add_button="bottom" btn_title="Thin Films Types" btn_style="3d" btn_color="juicy-pink" btn_align="center" btn_link="url:https%3A%2F%2Fvaccoat.com%2Fblog%2Fthin-film-and-thin-films-types%2F|target:_blank"] [/vc_cta][/vc_column_inner][/vc_row_inner][vc_row_inner][vc_column_inner][vc_column_text] Tin dioxide (SnO2), has received significant attention due to its potential applications in various fields such as coatings, energy harvesting, sensors, and electronic devices. Since the characteristics of the thin films depend on the conditions of the deposition and deposition methods, a lot of studies have been…
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02Aug 2022 by elina 16 Comments
What is RF Sputtering? | DC vs RF Sputtering

What is RF Sputtering? | DC vs RF Sputtering

Report, Sputter Coater, Sputtering
[vc_row][vc_column width="3/4"][vc_row_inner][vc_column_inner width="1/2"][vc_column_text css=""] Why RF Magnetron Sputtering? Direct current (DC) sputtering is a cost-effective method for thin layer deposition of electrically conductive metallic targets. But this method is not applicable for non-conductive dielectric target materials, since bombarding such targets with positive ions causes charging the surface of the target, which repels further positive ion bombarding the surface, resulting in the cessation of sputtering process and arcing into the plasma. In order to overcome DC sputtering shortcomings, RF sputtering is widely used for electrically non-conductive target materials deposition. [/vc_column_text][/vc_column_inner][vc_column_inner width="1/2"][vc_column_text css=""] [lwptoc backgroundColor="#d6d6d6" borderColor="#5b5b5b" skipHeadingText="References|Recent Posts|RF Sputtering Systems|The Other Sputter Coaters|What is SEM?|FESEM vs SEM"] [/vc_column_text][/vc_column_inner][/vc_row_inner][vc_row_inner css=".vc_custom_1715789177436{background-color: #d9d9d9 !important;}"][vc_column_inner width="1/2"][vc_video link="https://youtu.be/sz5P0D8JZi4?si=i1uuV41yoflsilpK" align="center" css=".vc_custom_1741299405278{border-radius: 2px !important;}"][vc_column_text css=".vc_custom_1741299430011{margin-top: -20px !important;}"] Vac Coat Sputter Coaters [/vc_column_text][/vc_column_inner][vc_column_inner width="1/2"][vc_cta h2="" txt_align="center" style="3d" color="mulled-wine" add_button="bottom" btn_title="What…
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27Jun 2022 by elina 2 Comments
Effect of Chamber Ultimate Pressure on Carbon Coating

Effect of Chamber Ultimate Pressure on Carbon Coating

Carbon Coater, Report
[vc_row][vc_column width="3/4"][vc_row_inner][vc_column_inner][vc_column_text] Effect of Chamber Ultimate Pressure on Carbon Coating Electron microscopy is a method to image samples, which provides much higher resolution and further details compared to traditional optical microscopes. Samples should be conductive for this analysis, so a conductive layer is normally deposited on the sample surface to image nonconductive surfaces. Carbon is one of the common materials used for sample preparation for electron microscopy, but carbon coating needs a vacuum chamber to reach required conductivity [1]. [/vc_column_text][/vc_column_inner][/vc_row_inner][vc_row_inner][vc_column_inner width="1/2"][vc_video link="https://youtu.be/j91sE_ZwJWM" align="center" css=".vc_custom_1716721853667{border-radius: 2px !important;}"][vc_column_text css=".vc_custom_1716721761116{margin-top: -20px !important;}"] How Does A Carbon Coater Work? [/vc_column_text][/vc_column_inner][vc_column_inner width="1/2"][vc_cta h2="" txt_align="center" style="3d" color="mulled-wine" add_button="bottom" btn_title="Carbon Coating" btn_style="3d" btn_color="juicy-pink" btn_align="center" btn_link="url:https%3A%2F%2Fvaccoat.com%2Fblog%2Fcarbon-coating-for-em-edx-sample-preparation%2F|title:Carbon%20Coating%20for%20EM%20and%20EDX%20Sample%20Preparation|target:_blank"] [/vc_cta][/vc_column_inner][/vc_row_inner][vc_separator][vc_row_inner][vc_column_inner][vc_column_text] Carbon can be coated in a low-vacuum or high vacuum system, choosing each results in different coating structure. In a typical…
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21Jun 2022 by elina 4 Comments
Balanced and Unbalanced Magnetron Sputtering

Balanced and Unbalanced Magnetron Sputtering

Report, Sputter Coater, Sputtering
[vc_row][vc_column width="3/4"][vc_row_inner][vc_column_inner][vc_column_text css=""] Balanced and Unbalanced Magnetron Sputtering Sputtering was first introduced in 1852 and was used by a person named Groe. He could using an electrical discharge deposited the metal film on a cold cathode. At first, sputtering was used for deposition of the refractory metals film, whose deposition was not possible by thermal evaporation, but gradually, using radio frequency waves (RF Sputtering), the possibility of dielectric films was also provided by the sputtering deposition method. [/vc_column_text][/vc_column_inner][/vc_row_inner][vc_row_inner css=".vc_custom_1743259804428{background-color: #D9D9D9 !important;}"][vc_column_inner width="1/2"][vc_video link="https://www.youtube.com/watch?v=R-oNxgmgbJg" align="center" css=".vc_custom_1743259788547{border-radius: 2px !important;}"][vc_column_text css=".vc_custom_1655790224831{margin-top: -20px !important;}"] Gencoa Circular FFE Magnetron [/vc_column_text][/vc_column_inner][vc_column_inner width="1/2"][vc_cta h2="" txt_align="center" style="3d" color="mulled-wine" add_button="bottom" btn_title="Thermal Evaporation" btn_style="3d" btn_color="juicy-pink" btn_align="center" css="" btn_link="url:https%3A%2F%2Fvaccoat.com%2Fblog%2Fthermal-evaporation-method%2F|title:Thin%20Film%20Deposition%20By%20Thermal%20Evaporation%20Method|target:_blank"] [/vc_cta][/vc_column_inner][/vc_row_inner][vc_row_inner][vc_column_inner][vc_column_text css=""] Sputtering is in fact the process of transferring the momentum of the particles (usually the ions of neutral gases) to the surface of the target. Parameters such as…
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07Jun 2022 by elina No Comments
Unbalanced Magnetron Cathodes

Unbalanced Magnetron Cathodes

Report, Sputter Coater, Sputtering
[vc_row][vc_column width="3/4"][vc_row_inner][vc_column_inner][vc_column_text] Unbalanced Magnetron Sputtering Cathodes Balanced and unbalanced magnetron cathodes in sputtering systems have their advantages and disadvantages as mentioned in “balanced and unbalanced magnetron sputtering” article. What is Unbalanced Magnetron? Balanced magnetic fields with magnetic field lines confined around the cathode, limit the charged colliding particles (electron-ions) to the target surface which benefits low friction coatings; whereas in an unbalanced magnetron with some magnetic field lines toward the substrate, the ions bombard the thin film, affecting thin film surface morphology and adhesion to the substrate, suitable for pre-cleaning and hard coatings. Since balanced cathodes are common, here we discuss the unbalanced magnetron cathodes and theirs specifications. [/vc_column_text][/vc_column_inner][/vc_row_inner][vc_row_inner css=".vc_custom_1716046704963{background-color: #d9d9d9 !important;}"][vc_column_inner width="1/2"][vc_single_image image="5307" img_size="large" add_caption="yes" alignment="center" style="vc_box_outline" border_color="mulled_wine"][/vc_column_inner][vc_column_inner width="1/2"][vc_video link="https://youtu.be/xjEOoKi6qUo?si=o_jqQE1m-0AD6ya3"][vc_column_text css=".vc_custom_1716069115122{margin-top: -20px !important;}"] How Triple Target Sputter Coater DST3-A…
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25Apr 2022 by elina No Comments
Effect of Base Pressure on Thin Film Grain Size in Sputtering

Effect of Base Pressure on Thin Film Grain Size in Sputtering

Report, Sputter Coater, Sputtering, Thin Film, Vacuum Pumps
[vc_row][vc_column width="3/4"][vc_row_inner][vc_column_inner][vc_column_text] Effect of Base Pressure on Thin Film Grain Size in Sputtering Sputter coating of thin films is operated in a vacuum chamber, where pressure is much lower than atmosphere environment, to reduce the air contaminants in the chamber and have a cleaner thin film. Pure argon purge into the chamber also helps to remove residual air and increase sputtering deposition rate. As the chamber is evacuated before argon purge, various contaminants of the environment like nitrogen, oxygen, carbon dioxide, and water vapor get out of the chamber gradually, where water vapor is the greatest barrier toward reaching higher vacuum levels. [/vc_column_text][/vc_column_inner][/vc_row_inner][vc_row_inner][vc_column_inner width="1/2"][vc_cta h2="" txt_align="center" style="3d" color="mulled-wine" add_button="bottom" btn_title="Thin Films Types" btn_style="3d" btn_color="juicy-pink" btn_align="center" btn_css_animation="none" btn_link="url:https%3A%2F%2Fvaccoat.com%2Fblog%2Fthin-film-and-thin-films-types%2F|title:Thin%20Film%20and%20Thin%20Films%20Types|target:_blank"][/vc_cta][/vc_column_inner][vc_column_inner width="1/2"][vc_cta h2="" txt_align="center" style="3d" color="mulled-wine" add_button="bottom" btn_title="What is Sputtering?" btn_style="3d" btn_color="juicy-pink" btn_align="center" btn_css_animation="none"…
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11Apr 2022 by elina No Comments
Outgassing | What is Outgassing in Vacuum Chamber?

Outgassing | What is Outgassing in Vacuum Chamber?

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[vc_row][vc_column width="3/4"][vc_row_inner][vc_column_inner][vc_column_text css=""] Outgassing in Vacuum Deposition Outgassing is defined as the release of a gas which has been trapped, dissolved, absorbed, or frozen in a material, a challenge in the way of high vacuum deposition. In thermodynamics, gas molecules always tend to move from a place with higher pressure to a place with lower pressure, so decreasing the pressure level in a chamber faces impediments like gas load into the chamber. [/vc_column_text][/vc_column_inner][/vc_row_inner][vc_row_inner][vc_column_inner][vc_video link="https://youtu.be/NzSTxik7sWc" align="center"][vc_column_text css=".vc_custom_1717776474651{margin-top: -20px !important;}"] Elastomer Outgassing Tech Tips [/vc_column_text][/vc_column_inner][/vc_row_inner][vc_row_inner css=".vc_custom_1717776522151{background-color: #d9d9d9 !important;}"][vc_column_inner][vc_column_text css=""] In high vacuum systems, the most important source of gas load in the vacuum process is the gases that are expelled from the surfaces of objects in the vacuum chamber called outgassing. As to reduce the incomplete bonds of surface atoms, surfaces are active…
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28Feb 2022 by elina No Comments

Thickness Uniformity of Thin Films by Magnetron Sputtering

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[vc_row][vc_column width="3/4"][vc_row_inner][vc_column_inner width="1/2"][vc_column_text css=""] Thickness Uniformity of Thin Films by Magnetron Sputtering Magnetron Sputtering is a highly advantageous method for depositing thin films of materials on a substrate for research and industrial purposes. Thickness Uniformity of thin films is an important parameter in science and industry, which can be obtained by magnetron sputtering to a high degree of precision (<2% of thickness variation over the substrate) [1]. Vac Coat Sputter Coaters can sputter materials by magnetron sputtering method through precise control over chamber pressure, source to substrate distance, and substrate rotation to enhance thickness uniformity of the coated film. [/vc_column_text][/vc_column_inner][vc_column_inner width="1/2"][vc_column_text css=""] [lwptoc numeration="decimalnested" numerationSuffix="dot" backgroundColor="#d6d6d6" borderColor="#5b5b5b" skipHeadingText="Recent Posts|References|Related Posts|Some of Vac Coat\'s Products|Sputter Coater|Carbon Coater|SEM Coater|Thermal"] [/vc_column_text][/vc_column_inner][/vc_row_inner][vc_row_inner css=".vc_custom_1716069440133{background-color: #d9d9d9 !important;}"][vc_column_inner width="1/2"][vc_cta h2="" style="3d" color="mulled-wine" add_button="bottom" btn_title="Pulsed DC Sputtering" btn_style="3d"…
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