Pulsed DC Magnetron Sputtering
[vc_row][vc_column width="1/4"][vc_row_inner][vc_column_inner][vc_column_text] [lwptoc backgroundColor="#d6d6d6" borderColor="#5b5b5b" skipHeadingText="Recent Posts|References"] [/vc_column_text][/vc_column_inner][/vc_row_inner][vc_wp_posts number="10"][/vc_column][vc_column width="3/4"][vc_row_inner][vc_column_inner][vc_column_text] What is Pulsed DC Sputtering? Pulsed DC Magnetron Sputtering is a physical vapor deposition method used to make thin films of various materials including conductors and insulators. It is especially preferable in reactive ion sputtering where the risk of arc discharge damage is high. The arc discharge is a result of charge accumulation on the target and is harmful to both the thin film and the power supply. [/vc_column_text][/vc_column_inner][/vc_row_inner][vc_row_inner][vc_column_inner width="1/2"][vc_cta h2="" txt_align="center" style="3d" color="mulled-wine" add_button="bottom" btn_title="What is Sputtering?" btn_style="3d" btn_color="juicy-pink" btn_align="center" btn_link="url:https%3A%2F%2Fvaccoat.com%2Fblog%2Fsputtering%2F|target:_blank"][/vc_cta][/vc_column_inner][vc_column_inner width="1/2"][vc_cta h2="" txt_align="center" style="3d" color="mulled-wine" add_button="bottom" btn_title="What is PVD?" btn_style="3d" btn_color="juicy-pink" btn_align="center" btn_link="url:https%3A%2F%2Fvaccoat.com%2Fblog%2Fphysical-vapor-deposition-pvd%2F|title:Physical%20Vapor%20Deposition%20(PVD)|target:_blank"][/vc_cta][/vc_column_inner][/vc_row_inner][vc_separator][vc_row_inner][vc_column_inner width="1/2"][vc_column_text] As a simple and reliable vacuum deposition technique, Sputtering is one of the most common techniques for thin films deposition methods today. In a…