Thickness Uniformity of Thin Films by Magnetron Sputtering
[vc_row][vc_column width="3/4"][vc_row_inner][vc_column_inner width="1/2"][vc_column_text css=""] Thickness Uniformity of Thin Films by Magnetron Sputtering Magnetron Sputtering is a highly advantageous method for depositing thin films of materials on a substrate for research and industrial purposes. Thickness Uniformity of thin films is an important parameter in science and industry, which can be obtained by magnetron sputtering to a high degree of precision (<2% of thickness variation over the substrate) [1]. Vac Coat Sputter Coaters can sputter materials by magnetron sputtering method through precise control over chamber pressure, source to substrate distance, and substrate rotation to enhance thickness uniformity of the coated film. [/vc_column_text][/vc_column_inner][vc_column_inner width="1/2"][vc_column_text css=""] [lwptoc numeration="decimalnested" numerationSuffix="dot" backgroundColor="#d6d6d6" borderColor="#5b5b5b" skipHeadingText="Recent Posts|References|Related Posts|Some of Vac Coat\'s Products|Sputter Coater|Carbon Coater|SEM Coater|Thermal"] [/vc_column_text][/vc_column_inner][/vc_row_inner][vc_row_inner css=".vc_custom_1716069440133{background-color: #d9d9d9 !important;}"][vc_column_inner width="1/2"][vc_cta h2="" style="3d" color="mulled-wine" add_button="bottom" btn_title="Pulsed DC Sputtering" btn_style="3d"…




